Focused Ion Beam Lithography

Focused Ion Beam Direct Write Nanofabrication of Surface Phonon Polariton Metamaterial Nanostructures

Beyond the capabilities for sample characterization via TEM liftout and 3-D sectioning, the focused ion beam microscope (FIB) is useful tool for direct-write lithography of novel materials structures. It has unique control in varying the depth of structure feature through beam and dose control. Because of this, FIB may be used to exploit 3-D resonant modes in metamaterial nanostructures in ways...

Cross beam lithography at TASC

Highlights Focused Ion Beam Lithography is a very powerful technique for directly writing patterns on many substrates, it is a mask-less and resist-less technique that allows a very wide range of applications, providing a resolution down to 10 nm. Joined to the Electron Beam Lithography and the Gas Deposition System it became a very versatile tool for many fabrication processes. Using a dual-be...

Review Article Direct-Write Ion Beam Lithography

Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and nanoscale designs on the surface of practically any solid sample material. Based on the type of ion-sample interaction utilized, FIBbasedmanufacturing can be both subtractive and additive, even in the same processing step. Indeed, the capability of easily creating thr...

A Quantitative Comparison between Helium Ion and Electron Beam Lithography on PMMA Resist

Helium ion beam lithography (HIBL), an emerging technique that uses a sub-nanometre focused beam of helium ions to expose resist, has introduced an alternative to electron beam lithography (EBL) to extend beyond existing minimum feature sizes. HIBL has several advantages over EBL, including a higher patterning resolution due to a smaller spot size [1] and a reduced proximity effect due to low i...

Lithography-free positioned GaAs nanowire growth with focused ion beam implantation of Ga